OPTICAL LITHOGRAPHY.DILL FH.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 440-444; BIBL. 6 REF.Article

THERMAL EFFECTS ON THE PHOTORESIST AZ 1350J.DILL FH; SHAW JM.1977; I.B.M. J. RES. DEVELOP.; U.S.A.; DA. 1977; VOL. 21; NO 3; PP. 210-218; BIBL. 10 REF.Article

A ROTATING-COMPENSATOR FOURIER ELLIPSOMETER.HAUGE PS; DILL FH.1975; OPT. COMMUNIC.; NETHERL.; DA. 1975; VOL. 14; NO 4; PP. 431-437; BIBL. 11 REF.Article

IN-SITU MEASUREMENT OF DIELECTRIC THICKNESS DURING ETCHING OR DEVELOPING PROCESSES.KONNERTH KL; DILL FH.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 452-456; BIBL. 1 REF.Article

THERMAL ANALYSIS OF POSITIVE PHOTORESIST FILMS BY MASS SPECTROMETRY.SHAW JM; FRISCH MA; DILL FH et al.1977; I.B.M. J. RES. DEVELOP.; U.S.A.; DA. 1977; VOL. 21; NO 3; PP. 219-226; BIBL. 11 REF.Article

CHARACTERIZATION OF POSITIVE PHOTORESIST.DILL FH; HORNBERGER WP; HAUGE PS et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 445-452; BIBL. 7 REF.Article

MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS.DILL FH; NEUREUTHER AR; TUTTLE JA et al.1975; I.E.E.E. TRANS. ELECTRON DEVICES; U.S.A.; DA. 1975; VOL. 22; NO 7; PP. 456-464; BIBL. 6 REF.Article